WebChemical mechanical planarization (CMP) continues to be a key enabling technology for the development of these state-of-the-art architectures.1,2 As these new device … WebDec 1, 2013 · To achieve an efficient global planarization for device node dimensions of less than 32 nm, a comprehensive understanding of the physical, chemical, and tribo-mechanical/chemical action at...

ECS Journal of Solid State Science and Technology

WebChemical-mechanical planarization (CMP), a key manufacturing step enabling the continuation of Moore's Law, is increasingly employed also for the fabrication of “More … WebIn Cook and Liu’s models, the mechanical removal by abrasive particles is the dominant mechanism. Some researchers, instead, believe that the material removal is due to a … how many square meters in a rai

Approaches to Sustainability in Chemical Mechanical Polishing …

Webchemical-mechanical planarization; phase-change random-access memory; Fenton reaction; ferric–ionic catalyst; corrosion inhibitor; chalcogenide 1. Introduction Recently, memory semiconductor device technologies have evolved to achieve fast switching, low-power consumption, and low memory bit-cost via the scaling-down of memory cells. WebEnter the email address you signed up with and we'll email you a reset link. WebNov 26, 2024 · Chemical mechanical polishing (CMP) is an essential planarization process for semiconductor manufacturing. The application of CMP has been increasing … how many square meters is texas